GATE 2023 correction window to open till October 20, check latest notice at gate.iitk.ac.in


Indian Institute of Technology, IIT Kanpur has issued a notice for all candidates regarding the on-going Graduate Aptitude Test in Engineering, GATE 2023 registration portal. This comes after several reports that mentioned some concerns raised by candidates. IIT Kanpur has informed that the correction portal at the GATE 2023 application window is facing some problems at present.
Early in the day, authorities had shared that the correction window was facing some issues which were being checked and worked upon. The officials had also advised candidates not to panic or submit a new application.

GATE 2023

GATE 2023

An official notice reads, “Please note that you will have two more weeks to rectify the errors, after the application window closes, i.e until 20th Oct. Also note that you need not submit new application for the defects in your application.”
As per the latest update, GATE 2023 Twitter handle shared, “Our technical team has resolved the issue. Please try again. If it is not working, please send details (enrollment ID and screenshot) to https://gate.iitk.ac.in/report_issue.html… for faster resolution.”

Candidates are also notified that the registration window to apply for the exam would remain open till October 07, 2022. It is to be noted that GATE 2023 registration without any additional late fee will be accepted till September 30, 2022. After that, one more week’s extended time would be given to aspirants, but late fee charges would be applicable.

Once the registration window is closed, the GATE 2023 correction window would be opened for candidates and they would get to make changes and even choose to change the exam city. The correction window would remain open till October 20, 2022.
GATE 2023 exam is set to be held in February 2023. The admit cards for the same would be released on January 03, 2023 on the official website – gate.iitk.ac.in. For more details, candidates are advised to visit the official portal.





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